Smearing method of metal and semiconductor composite
Posted: Fri Aug 02, 2024 3:21 am
Dear vasp users,
For the calculation of conductor and semiconductor composite, which smearing method should I use to optimize the geometry?
I want to construct ZnTe(semiconductor) on the Ti3C2(conductor) layer.
If I optimize a slab composed of above composite with ISMEAR=0, then I also have to optimize the Ti3C2 bulk structure with ISMEAR=0 before constructing the slab, although it is metallic material?
Thank you for the help.
Regards.
For the calculation of conductor and semiconductor composite, which smearing method should I use to optimize the geometry?
I want to construct ZnTe(semiconductor) on the Ti3C2(conductor) layer.
If I optimize a slab composed of above composite with ISMEAR=0, then I also have to optimize the Ti3C2 bulk structure with ISMEAR=0 before constructing the slab, although it is metallic material?
Thank you for the help.
Regards.